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Home Products Wafer-Level-Optics (WLO) Diffractive Optical Element (DOE)

Diffractive Optical Element (DOE)

Wafer-level imprinting process: scalable and cost-effective manufacturing on glass or polymer substrates

Beam shaping versatility: beam splitting, beam homogenization, dot/matrix projection, vortex beams

High transmission efficiency: optimized micro-structures, AR coating optional

Precision and repeatability: wafer-level pattern fidelity for consistent optical performance

Customizable formats: circular, linear, or freeform patterns

Applications: 3D sensing (VCSEL-based), AR/VR displays, LiDAR, biomedical diagnostics, machine vision, and laser material processing

Diffractive Optical Element (DOE)

Key Specifications

Materials

Polymer on Glass (PoG)

Wavelength Range

400 – 2000 nm (customizable for UV / MWIR)

Beam Shaping Functions

Beam splitting, homogenization, dot/matrix projection, ring/freeform patterns

Divergence / Expansion Angles

1° – 120° (typical)

Diffraction Efficiency

80% – 95% (typical, depending on wavelength and design)

Feature Size Accuracy

< 200 nm (sub-micron level)

Thermal Stability

–40 °C to +125 °C (typical)

Applications

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